We report the results of a reliability evaluation plan carried out on GaN/InGaN blue LEDs, including life tests at RT at three current levels: 20 mA, 50 mA, 100 mA, thermal storage at high ambient temperature (up to 300°C), and finally high current density (≈100 A/cm2 ) and high junction temperature (300 °C). Failure modes consist of: (a) an increase in series resistance and/or forward voltage; (b) an increase in the tunneling component of forward diode current, and of reverse current; (c) a substantial degradation of optical intensity. Device degradation is correlated with a remarkable decrease in the apparent doping and with the appearance of deep levels having activation energies of 0.55 ±0.05 eV and 1.21 eV, which may act as "dark" centers. Degradation has been interpreted as a result of the instability of dopant in the p-layer. Breaking of Mg-H complexes, with subsequent formation of Mg-H2 and Mg-H-N can in fact explain both the active doping decrease (resulting in increased p-layer resistivity, higher forward voltage and series resistance, and increasing current crowding), and the occurrence of deep levels.

Reliability of GaN-based LEDs

MENEGHESSO, GAUDENZIO;LEVADA, SIMONE;MENEGHINI, MATTEO;ZANONI, ENRICO
2004

Abstract

We report the results of a reliability evaluation plan carried out on GaN/InGaN blue LEDs, including life tests at RT at three current levels: 20 mA, 50 mA, 100 mA, thermal storage at high ambient temperature (up to 300°C), and finally high current density (≈100 A/cm2 ) and high junction temperature (300 °C). Failure modes consist of: (a) an increase in series resistance and/or forward voltage; (b) an increase in the tunneling component of forward diode current, and of reverse current; (c) a substantial degradation of optical intensity. Device degradation is correlated with a remarkable decrease in the apparent doping and with the appearance of deep levels having activation energies of 0.55 ±0.05 eV and 1.21 eV, which may act as "dark" centers. Degradation has been interpreted as a result of the instability of dopant in the p-layer. Breaking of Mg-H complexes, with subsequent formation of Mg-H2 and Mg-H-N can in fact explain both the active doping decrease (resulting in increased p-layer resistivity, higher forward voltage and series resistance, and increasing current crowding), and the occurrence of deep levels.
2004
WOCSDICE 2004, 28th Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe
802272050X
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2430029
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