: The X-ray-induced, nonthermal fluidization of the prototypical SiO2 glass is investigated by X-ray photon correlation spectroscopy in the small-angle scattering range. This process is initiated by the absorption of X-rays and leads to overall atomic displacements which reach at least few nanometers at temperatures well below the glass transition. At absorbed doses of ∼5 GGy typical of many modern X-ray-based experiments, the atomic displacements display a hyperdiffusive behavior and are distributed according to a heavy-tailed, Lévy stable distribution. This is attributed to the stochastic generation of X-ray-induced point defects which give rise to a dynamically fluctuating potential landscape, thus providing a microscopic picture of the fluidization process.

Stochastic atomic acceleration during the X-ray-induced fluidization of a silica glass

Dallari, Francesco;Martinelli, Alessandro;Monaco, Giulio
2023

Abstract

: The X-ray-induced, nonthermal fluidization of the prototypical SiO2 glass is investigated by X-ray photon correlation spectroscopy in the small-angle scattering range. This process is initiated by the absorption of X-rays and leads to overall atomic displacements which reach at least few nanometers at temperatures well below the glass transition. At absorbed doses of ∼5 GGy typical of many modern X-ray-based experiments, the atomic displacements display a hyperdiffusive behavior and are distributed according to a heavy-tailed, Lévy stable distribution. This is attributed to the stochastic generation of X-ray-induced point defects which give rise to a dynamically fluctuating potential landscape, thus providing a microscopic picture of the fluidization process.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/3468826
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