Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneat
Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam
CORSO, ALAIN JODY;NICOLOSI, PIERGIORGIO;NARDELLO, MARCO;PELIZZO, MARIA-GUGLIELMINA
2013
Abstract
Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneat
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Damage of multilayer optics with varying capping layers induced by EUV beam JApplPhys_113_203106.pdf
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