We have measured the growth of liquid films of Ar and Kr adsorbed on a geometrically structured substrate obtained by machining on a lathe a thin Al disk with a sharp cutting tool. Near liquid-vapor bulk coexistence, the film mass is found to diverge as a power law of the chemical potential difference from saturation with an exponent x=-1.93 +/-0.10, in very good agreement with recent scaling analysis results.
Wetting on a geometrically structured substrate
BRUSCHI, LORENZO;MISTURA, GIAMPAOLO
2001
Abstract
We have measured the growth of liquid films of Ar and Kr adsorbed on a geometrically structured substrate obtained by machining on a lathe a thin Al disk with a sharp cutting tool. Near liquid-vapor bulk coexistence, the film mass is found to diverge as a power law of the chemical potential difference from saturation with an exponent x=-1.93 +/-0.10, in very good agreement with recent scaling analysis results.
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