Experimental results on the realization of Mo/Si multilayer mirrors for EUV applications are presented. The multilayers have been deposited using RF-magnetron sputtering. The characterization of single layers and multilayers has been performed using different physical techniques. The reflectivity of multilayer mirrors optimised for 13 and 19 nm radiation has been measured and compared to simulation.
First realization and characterization of multilayer EUV reflective coatings
NICOLOSI, PIERGIORGIO;PATELLI, ALESSANDRO;PELIZZO, MARIA-GUGLIELMINA;MAGGIONI, GIANLUIGI;MATTEI, GIOVANNI;POLETTO, LUCA;MAZZOLDI, PAOLO;TONDELLO, GIUSEPPE
2001
Abstract
Experimental results on the realization of Mo/Si multilayer mirrors for EUV applications are presented. The multilayers have been deposited using RF-magnetron sputtering. The characterization of single layers and multilayers has been performed using different physical techniques. The reflectivity of multilayer mirrors optimised for 13 and 19 nm radiation has been measured and compared to simulation.
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