Ionising Radiation Effects on Ultra-Thin Gate oxide MOS

INVITED PAPER We have briefly reviewed the most important degradation mechanisms affecting ultra-thin gate oxides after exposure to ionizing irradiation. The increase of the gate leakage current seems the most crucial issue for device lifetime, especially for non-volatile memory and dynamic logic. The build-up of positive charge in the oxide and the subsequent threshold voltage shift, which was the major concern for thicker oxide, are no longer appreciable in today’s devices due to the reduced oxide thickness permitting a fast recombination of trapped holes with electrons from interfaces. Among the leakage currents affecting thin oxides we have considered here the Radiation Induced Leakage Current (RILC) and the Radiation Soft Breakdown (RSB). RILC is observed after irradiation with a low Linear Energy Transfer (LET) radiation source and comes from a trap-assisted tunneling of electrons mediated by the neutral traps produced by irradiation. RILC depends on the applied bias during irradiation and the maximum is measured when devices are biased in flat band. Contrarily to RILC, RSB is observed after irradiation with high LET ions and derives from the formation of several conductive paths across the oxide corresponding to the ion hits. RSB conduction is explained by the theory of the Quantum Point Contact as also proposed for the electrically induced Soft breakdown. Finally, we present some preliminary results, which indicate that although the direct effects of irradiation (in terms of gate leakage current increase) are small for oxide thinner than 3nm, it is possible that these devices may experience an accelerated wear-out and/or breakdown after subsequent electrical stress relative to a fresh (not irradiated) device.