High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution issue gold zone plate with 70 nm resolution and thickness of 0.4 mum are shown. When the efficiency is more important, multilevel zone plate can provide an increase of the first diffraction order while suppressing higher ones. The optical test of four level zone plate made by Gold or Nickel was performed at the European Synchrotron Radiation Facility, beamline ID21. At 7 KeV an efficiency of 55% was measured.

Toward high resolution and high efficiency Zone Plate for X-ray applications

ROMANATO, FILIPPO;
2000

Abstract

High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution issue gold zone plate with 70 nm resolution and thickness of 0.4 mum are shown. When the efficiency is more important, multilevel zone plate can provide an increase of the first diffraction order while suppressing higher ones. The optical test of four level zone plate made by Gold or Nickel was performed at the European Synchrotron Radiation Facility, beamline ID21. At 7 KeV an efficiency of 55% was measured.
2000
AIP Conf. Proc. 507
X-RAY MICROSCOPY: VI International Conference
1563969262
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/152490
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